Concept of mask/wafer co-optimization by moving the shot with mask and wafer double simulation to minimize wafer error. (IMAGE)

SPIE--International Society for Optics and Photonics

Concept of mask/wafer co-optimization by moving the shot with mask and wafer double simulation to minimize wafer error.

Caption

Concept of mask/wafer co-optimization by moving the shot with mask and wafer double simulation to minimize wafer error. VSB shot configurations and its corresponding pattens on mask. MWCO mask and its wafer print. Wafer Process Windows shows MWCO improved process window by 2x. Process window is a key measurement of wafer print quality. 

Credit

The Authors doi 10.1117/1.JMM.23.1.011207.

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