The schematic fabrication and formation of Ag@MP micropatterns (IMAGE)

International Journal of Extreme Manufacturing

The schematic fabrication and formation of Ag@MP micropatterns

Caption

The femtosecond laser maskless optical projection lithography (Fs-MOPL) technique is proposed to fabricate Ag@methacrylamide chitosan/poly(ethylene glycol) diacrylate (Ag@MP) micropatterns in one step, a highly efficient process that enables pattern customization. We found that hydroxyl and amino groups on MCS influenced the number of NPs compared to the precursors without methacrylamide chitosan.

Credit

By Fan-Chun Bin, Xin-Yi Wu, Jie Liu, Xian-Zi Dong, Teng Li, Qi Duan, Jian-Miao Zhang, Katsumasa Fujita and Mei-Ling Zheng

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Credit must be given to the creator.

License

CC BY

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