Pic 1 (IMAGE)
Caption
The research team led by Dr. Jihye Lee, Director of the Nano Lithography Research Center at KIMM, has successfully demonstrated a 576 cm² ultra-large photoelectrode system using a high-concentration BiVO₄ (bismuth vanadate) precursor solution technology(From left in the photo: Dr. Jihye Lee, Student Researcher Hoyoung Lee).
Credit
Korea Institute of Machinery and Materials (KIMM)
Usage Restrictions
The sources of photos and research results from KIMM must be specified.
License
Original content