Figure | Principe of LOTB. (IMAGE)
Caption
Figure | Principe of LOTB. a. Schematic diagram of the bubble flattening process with LOTB. In stage (i), liquid-filled nanobubbles are generated during wet transfer; in stage (ii), a high-temp field region and a low-temp field region are generated under laser irradiation, which sublimates the TMD film to generate a sacrifice region and enables the phase transition of the inclusions, respectively; in stage (iii), the inclusions inside the nanobubbles flow out of the sacrifice region under the pressure difference inside and outside nanobubbles, which flattens the film together with a stress-pulling effect. b. Simulated temperature distribution (black line) under the irradiation of a Gaussian laser beam (green line, normalized) with an intensity of 106.1 mW/µm2 and beam diameter of 0.3 µm. The red and blue regions indicate the high-temp field and low-temp field regions, respectively. c. AFM topography of a transferred 1L-MoS2 sample with nanobubbles. The inset shows the optical image of the 1L-MoS2 film, where the dashed rectangle indicates the region of the AFM topography. d. Aspect ratio change of a nanobubble under different irradiation laser power , where the orange area indicates the phase transition region leading to an abrupt change of aspect ratio and the black dashed line indicates the power threshold. The insets show the corresponding AFM topography images of the same nanobubble under different irradiation laser powers. e Calculated pressure difference inside and outside the nanobubble versus the aspect ratio. The radius of the nanobubble is taken as 200 nm.
Credit
Benfeng Bai et al.
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CC BY