Robust and ultralow-energy direct photolithography of quantum dots via dual-ligand passivated thiol-ene click chemistry (IMAGE)

Tsinghua University Press

Robust and ultralow-energy direct photolithography of quantum dots via dual-ligand passivated thiol-ene click chemistry

Caption

The dual-ligand passivated thiol-ene click chemistry enables robust and ultralow-energy direct photolithography of quantum dots, achieving >6-fold enhancement in the storage lifetime and >15-fold improvement in photolithographic efficiency. The as-prepared light-emitting diodes exhibit remarkable electroluminescence performance and pixel densities.

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Nano Research, Tsinghua University Press

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