Argonne chemists Jeff Elam and Anil Mane (IMAGE) DOE/Argonne National Laboratory Caption Argonne chemists Jeff Elam (left) and Anil Mane (right) and colleagues have molecular layer etching that may help develop microelectronics and show the way beyond Moore's Law. Not shown are Matthias Young, Angel Yanguas-Gil, Devika Choudhury and Steven Letourneau. Credit Argonne National Laboratory Usage Restrictions None License Licensed content Disclaimer: AAAS and EurekAlert! are not responsible for the accuracy of news releases posted to EurekAlert! by contributing institutions or for the use of any information through the EurekAlert system.