Simplified simulation process of the numerical model. (IMAGE)
Caption
a, In this imaging example, B(x, y) is the gaussian beam, E(x, y) is the exposure dose sampled by structure. The aerial pattern I(x, y) convolving B(x, y) and E(x, y). Finally, the resist effect is described by the differentiable sigmoid function, and the simulation pattern D(x, y) is approximated by Sigmoid (I(x, y)). b-c) Schematic illustration of the AMLA profile b, before and (c) after OPC, where black, red and blue lines represent target profile, simulation profile and experimental profile of AMLA respectively.
Credit
by Shiyi Luan, Fei Peng,Guoxing Zheng, Chengqun Gui, Yi Song, and Sheng Liu
Usage Restrictions
Credit must be given to the creator.
License
CC BY