Principle of the nanoscale multi-beam lithography to fabricate three-dimensional photonic crystal structures in crystals. (IMAGE)

Light Publishing Center, Changchun Institute of Optics, Fine Mechanics And Physics, CAS

Principle of the nanoscale multi-beam lithography to fabricate three-dimensional photonic crystal structures in crystals.

Caption

a, Generation and tight focusing of femtosecond laser multi-beam optical field. b, Subwavelength photonic crystal structure fabrication and grating device preparation

Credit

by Jiaqun Li, Jianfeng Yan, Lan Jiang, Jiachen Yu, Heng Guo, Liangti Qu

Usage Restrictions

Credit must be given to the creator.

License

CC BY

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