Exceptional points and suppression of the surface roughness induced back scattering by a lithographically defined Mie scatterer embedded in channel waveguides and resonators. (IMAGE)

Light Publishing Center, Changchun Institute of Optics, Fine Mechanics And Physics, CAS

Exceptional points and suppression of the surface roughness induced back scattering by a lithographically defined Mie scatterer embedded in channel waveguides and resonators.

Caption

(a) Scanning electron microscope (SEM) image of a channel waveguide (WG) with a lithographically defined symmetric meta-unit on SOI substrate. (b) Scanning electron microscope (SEM) image of a channel waveguide (WG) with a lithographically defined rectangular-shaped symmetric Mie-scatterer on SOI substrate (top). Design parameter space for such Mie scatterer (bottom). (c) Optical impedance matching of the complex reflection coefficient to obtain zero reflection at exceptional point (EP).

Credit

by Hwaseob Lee, Ali Kecebas, Feifan Wang, Lorry Chang, Sahin K. Özdemir, Tingyi Gu

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Credit must be given to the creator.

License

CC BY

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