Remote ICP-CVD system (image) Ulsan National Institute of Science and Technology(UNIST) Share Print E-Mail Caption Remote ICP-CVD system with borazine mass flow controller (MFC) for precise control of borazine flow. The a-BN films were grown on Si substrates at 400 °C. Credit UNIST, SAIT, University of Cambridge, Catalan Institute of Nanoscience and Nanotechnology Usage Restrictions None Share Print E-Mail Disclaimer: AAAS and EurekAlert! are not responsible for the accuracy of news releases posted to EurekAlert! by contributing institutions or for the use of any information through the EurekAlert system.