Exposure strategies for improving TPL throughput. (IMAGE)

Light Publishing Center, Changchun Institute of Optics, Fine Mechanics And Physics, CAS

Exposure strategies for improving TPL throughput.

Caption

a, The classical point-by-point exposure. b, Layer-by-layer exposure. c, Multi-beam exposure.

Credit

by Shaoliang Yu, Qingyang Du, Cleber Renato Mendonca, Luigi Ranno, Tian Gu and Juejun Hu

Usage Restrictions

Credit must be given to the creator.

License

CC BY

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