Fig. 5 (IMAGE) Light Publishing Center, Changchun Institute of Optics, Fine Mechanics And Physics, CAS Caption Fig. 5 AI-driven ILT applications. EUV: extreme ultraviolet lithography. DUV: deep ultraviolet lithography. Credit Yang, Y., Liu, K., Gao, Y. et al. Usage Restrictions Credit must be given to the creator. License CC BY Disclaimer: AAAS and EurekAlert! are not responsible for the accuracy of news releases posted to EurekAlert! by contributing institutions or for the use of any information through the EurekAlert system.