New method for fabricating pn diodes (IMAGE)

Nagoya University

New method for fabricating pn diodes

Caption

Illustration of the new fabrication process: ion implantation of nickel atoms, followed by low-temperature plasma treatment and high-temperature annealing (heating) to create stable p-type layers in gallium oxide. 

 

Credit

Center for Low-Temperature Plasma Sciences, Nagoya University

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Credit must be given to the creator.

License

CC BY

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