Artificial intelligence-driven inverse lithography technology
Peer-Reviewed Publication
Updates every hour. Last Updated: 29-Dec-2025 02:11 ET (29-Dec-2025 07:11 GMT/UTC)
Inverse lithography technology (ILT) is driving transformative innovations in semiconductor patterning processes. This paper reviews the evolution of ILT, providing an analysis of the applications in semiconductor manufacturing. In recent years, artificial intelligence (AI) has introduced breakthroughs for ILT, such as convolutional neural networks, generative adversarial networks, and model-driven deep learning, demonstrating potential in large-scale integrated circuit design and fabrication. This paper discusses future directions for ILT, which is expected to provide insights into semiconductor industry development.
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