Researchers in China have created a highly sensitive cationic epoxy photoresist, named TP-EO, that significantly enhances the speed and resolution of two-photon laser direct writing lithography (TPL). This new material is 600 times more sensitive than the traditional SU-8 photoresists. By using a bimolecular sensitization system, TP-EO allows for efficient production of complex 3D microdevices. This advancement could lead to new applications in areas like optical devices, micro-electromechanical systems (MEMS), microfluidics, and tissue engineering.

The Korea Research Institute of Standards and Science (KRISS) has become the first in the world to observe the structural evolution of solute molecules in extremely supersaturated aqueous solutions, revealing that changes in molecular symmetry impact on the formation of new metastable material phases.

The new issue of Optica Quantum is available. A Gold Open Access journal from Optica Publishing Group, Optica Quantum provides a home for high-impact research in quantum information science and technology enabled by optics and photonics. October marks the one-year anniversary of Optica Quantum’s launch in 2023, acknowledged by the Editor-in-Chief and Deputy Editors in their commemorative editorial.